CORDIS Project
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This project focuses on optimizing cryogenic etching of low-k materials used in microelectronics to reduce signal transmission delays. By minimizing damage during processing, it aims to support advancements in semiconductor manufacturing, particularly for the 5nm technology node.
Since the beginning of the electronic evolution, size of transistor never stops to decrease accordingly to Moore’s law.
This scaling applies also to the interconnects, composed by conductor and insulating materials, leading to an overall increase of the resistivity of the conductor and the dielectric’s capacitance, ultimately causing delayed signal transmission (so-called RC delay).
In order to decrease the resistivity, Al was replaced by Cu as a conductor.
The circuit’s capacitance can be lowe…
INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM
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