CORDIS Project
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MD3 aims to enhance double patterning lithography techniques for semiconductor production by developing new strategies to reduce complexity and costs. The project evaluates innovative approaches to streamline the patterning process for improved efficiency.
Double patterning lithography has been identified as one of the most promising solutions for the 32nm node patterning.
This technique refers to a two step process where a first pattern is exposed, developed and sometimes etched and a second pattern is also exposed, developed and transferred on the top of the first one. <br/><br/>For the moment, several issues still need to be addressed for enabling the Double Patterning process in production such as layout decomposition, topography at wafer leve…
COMMISSARIAT A L ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
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Germany, Berlin
Type: Research institute
Activity type: Research Organisations
SME: No
France, Crolles
Type: Company (for-profit)
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
SME: No
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