CORDIS Project
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The project investigates double patterning lithography techniques to enable the production of semiconductor devices at smaller technology nodes. It aims to develop methods that enhance resolution without requiring significant changes to existing manufacturing processes.
Water immersion lithography has been widely accepted as patterning technology for the 45nm technology node, but solutions for the patterning of 32nm and 22nm technology nodes are not clear yet.EUV lithography is not yet available for industrial use, in spite of the impressive progresses registered till now, while multiple beam e beam lithography is still in development.
Double patterning seems to be the only viable option to support the development of future process generations in a cost effecti…
Numonyx Italy Srl
Partner organizations (coordinator is shown above), with normalized type and CORDIS activity type. Guests see up to 4 partners.
Netherlands, Veldhoven
Type: Company (for-profit)
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
SME: No
France, Crolles
Type: Company (for-profit)
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
SME: No
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