CORDIS Project
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The ATTO-SPIE project aims to enhance semiconductor manufacturing by developing advanced measurement techniques to understand the chemical reactions in photoresists during extreme ultraviolet lithography. By investigating these processes, the project seeks to reduce print failures and improve the reliability of integra…
After more than 40 years of development, the semiconductor industry is currently experiencing a paradigm shift as it transitions from deep ultraviolet (UV) to extreme UV (EUV) lithography for high-volume manufacturing (HVM) of integrated circuits (ICs) to ensure further device scaling to the future technology nodes.
However, integration of EUV lithographic scanners in HVM pipelines has been stymied by an incomplete knowledge of the in-situ photoresist radiochemistry that occurs during EUV exposu…
INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM
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