CORDIS Project
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This project focuses on advancing atomic layer deposition (ALD) technology to create thin films with precise control for various applications, including photovoltaics and flexible electronics. By establishing a research department at CTECHnano, the project aims to enhance the competitiveness of European industries in s…
Different from chemical vapor deposition (CVD) and physical vapor deposition (PVD), atomic layer deposition (ALD) is based on saturated surface reactions.
In this case, the thin films are grown in a layer-by-layer fashion allowing sub-nanometer thickness control, low temperature depositions, good uniformity and superior step coverage on high specific surface area components compared to CVD and PVD.These advantages of ALD over other thin film deposition processes have been conventionally applied…
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