CORDIS Project
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This project focuses on advancing semiconductor technology through innovative nanopatterning techniques. It aims to address challenges in extreme ultraviolet lithography by developing area-selective deposition methods, enhancing fabrication reliability and efficiency for future electronic devices.
Nanopatterning is the core of today’s and future semiconductor technology as it drives the downscaling of the devices below the 7 nm node, enabling higher speed, density of transistors and computing performance.
In addition, nanofabricated three-dimensional patterned structures are used in devices for photonics, biotechnology and other forms of nanotechnology.[1]Beyond the 10nm node, extreme ultraviolet lithography (EUVL) with a light source of 13.5 nm, will be applied.[2],[3] Associated with na…
INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM
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